JPS6190486A - 放電励起型短パルスレ−ザ装置 - Google Patents
放電励起型短パルスレ−ザ装置Info
- Publication number
- JPS6190486A JPS6190486A JP21284384A JP21284384A JPS6190486A JP S6190486 A JPS6190486 A JP S6190486A JP 21284384 A JP21284384 A JP 21284384A JP 21284384 A JP21284384 A JP 21284384A JP S6190486 A JPS6190486 A JP S6190486A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- discharge
- dielectric
- laser device
- pulse laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 title 1
- 239000004020 conductor Substances 0.000 claims abstract description 8
- 230000005684 electric field Effects 0.000 claims description 7
- 239000003989 dielectric material Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 8
- 230000010355 oscillation Effects 0.000 abstract description 6
- 230000017525 heat dissipation Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 14
- 239000003990 capacitor Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000010891 electric arc Methods 0.000 description 4
- 239000005297 pyrex Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- 241000282994 Cervidae Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- 241000973497 Siphonognathus argyrophanes Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 239000005667 attractant Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000031902 chemoattractant activity Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005520 electrodynamics Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21284384A JPS6190486A (ja) | 1984-10-09 | 1984-10-09 | 放電励起型短パルスレ−ザ装置 |
| US06/782,568 US4686682A (en) | 1984-10-09 | 1985-10-01 | Discharge excitation type short pulse laser device |
| EP94114362A EP0637106B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type laser device |
| EP93100578A EP0542718B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| DE3587852T DE3587852T2 (de) | 1984-10-09 | 1985-10-02 | Kurzpulslaservorrichtung vom Entladungsanregungstyp. |
| EP85112484A EP0177888B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| DE19853588118 DE3588118T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregter Laser zur Erzeugung kurzer Pulse |
| DE19853588137 DE3588137T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregtes Lasergerät |
| DE19853588088 DE3588088T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregter Laser zur Erzeugung kurzer Pulse |
| EP93100550A EP0543795B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| CA000492327A CA1259122A (en) | 1984-10-09 | 1985-10-04 | Discharge excitation type short pulse laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21284384A JPS6190486A (ja) | 1984-10-09 | 1984-10-09 | 放電励起型短パルスレ−ザ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6190486A true JPS6190486A (ja) | 1986-05-08 |
| JPH0344429B2 JPH0344429B2 (en]) | 1991-07-05 |
Family
ID=16629254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21284384A Granted JPS6190486A (ja) | 1984-10-09 | 1984-10-09 | 放電励起型短パルスレ−ザ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6190486A (en]) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988000403A1 (en) * | 1986-06-30 | 1988-01-14 | Kabushiki Kaisha Komatsu Seisakusho | Gas laser |
| JPS63229777A (ja) * | 1987-03-18 | 1988-09-26 | Mitsubishi Electric Corp | パルスレ−ザ装置 |
| JPH04221869A (ja) * | 1990-12-21 | 1992-08-12 | Mitsubishi Electric Corp | エキシマレーザ装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4729355U (en]) * | 1971-04-26 | 1972-12-04 | ||
| JPS4975093A (en]) * | 1972-10-17 | 1974-07-19 | ||
| JPS5810872A (ja) * | 1981-07-14 | 1983-01-21 | Toshiba Corp | 太陽電池の製造方法 |
| JPS5848485A (ja) * | 1981-09-16 | 1983-03-22 | Mitsubishi Electric Corp | パルスレ−ザ発振器 |
-
1984
- 1984-10-09 JP JP21284384A patent/JPS6190486A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4729355U (en]) * | 1971-04-26 | 1972-12-04 | ||
| JPS4975093A (en]) * | 1972-10-17 | 1974-07-19 | ||
| JPS5810872A (ja) * | 1981-07-14 | 1983-01-21 | Toshiba Corp | 太陽電池の製造方法 |
| JPS5848485A (ja) * | 1981-09-16 | 1983-03-22 | Mitsubishi Electric Corp | パルスレ−ザ発振器 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988000403A1 (en) * | 1986-06-30 | 1988-01-14 | Kabushiki Kaisha Komatsu Seisakusho | Gas laser |
| JPS63229777A (ja) * | 1987-03-18 | 1988-09-26 | Mitsubishi Electric Corp | パルスレ−ザ装置 |
| JPH04221869A (ja) * | 1990-12-21 | 1992-08-12 | Mitsubishi Electric Corp | エキシマレーザ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0344429B2 (en]) | 1991-07-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |